Sensitivity Analysis of Metamaterial-Inspired SIW Focusing on Resonator Misalignment

The performance of the metamaterial-inspired substrate-integrated waveguide is discussed in this work, concerning a resonator misalignment potentially caused by the fabrication process. Initially, the design parameters of the aforementioned waveguide at the X-band are presented, while its optimal operation is validated to prove the effectiveness of the apparatus. Then, various significant aspects of the polynomial chaos expansion theory are briefly introduced to facilitate the sensitivity analysis due to fabrication errors. The direction of misalignment is, firstly, investigated, while the general case is, also, considered, highlighting a notable immunity, especially at lower frequencies. Additionally, a parametric examination is conducted in terms of the fabrication tolerance, measured as a percentage of the resonator unit cell. All the required simulations are conducted utilizing the non-intrusive approach of the polynomial chaos methodology via the popular Finite-Difference Time-Domain scheme.