open access publication

Article, 2024

Correction: Effect of Ni dopant on the capacitive behavior of CuS for supercapacitor application

Journal of Materials Science: Materials in Electronics, ISSN 1573-482X, 0957-4522, Volume 35, 11, Page 801, 10.1007/s10854-024-12576-7

Contributors

Qasim, Bushra [1] Jabbour, Karam 0000-0001-5680-2975 [2] Ouladsmane, Mohamed Ali 0000-0001-5905-4642 [3] Waheed, Muhammad Suleman [4] Abdullah, Muhammad Imran 0000-0002-5496-1152 [5] Bano, Nigarish 0009-0002-8470-8542 [1] Manzoor, Sumaira 0000-0001-8187-1083 [1] Sillanpää, Mika Erik Tapio 0000-0003-3247-5337 [6] Ashiq, Muhammad Naeem (Corresponding author) [1]

Affiliations

  1. [1] Bahauddin Zakariya University
    2. [NORA names: Pakistan; Asia, South];
  2. [2] American University of the Middle East
    3. [NORA names: Kuwait; Asia, Middle East];
  3. [3] King Saud University
    4. [NORA names: Saudi Arabia; Asia, Middle East];
  4. [4] University of the Punjab
    5. [NORA names: Pakistan; Asia, South];
  5. [5] Government College University, Lahore
    6. [NORA names: Pakistan; Asia, South];

Keywords

CuS, Ni dopant, applications, capacitive behavior, dopants, effect, effect of Ni dopant, supercapacitor applications, supercapacitors

Data Provider: Digital Science

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