Article,
Isothermal Heteroepitaxy of Ge1–x Sn x Structures for Electronic and Photonic Applications
Affiliations
- [1] Forschungszentrum Jülich [NORA names: Germany; Europe, EU; OECD];
- [2] Aarhus University [NORA names: AU Aarhus University; University; Denmark; Europe, EU; Nordic; OECD];
- [3] Innovations for High Performance Microelectronics [NORA names: Germany; Europe, EU; OECD];
- [4] University of Leeds [NORA names: United Kingdom; Europe, Non-EU; OECD];
- [5] Roma Tre University [NORA names: Italy; Europe, EU; OECD]
Abstract
Epitaxy of semiconductor-based quantum well structures is a challenging task since it requires precise control of the deposition at the submonolayer scale. In the case of Ge1-x Sn x alloys, the growth is particularly demanding since the lattice strain and the process temperature greatly impact the composition of the epitaxial layers. In this paper, the realization of high-quality pseudomorphic Ge1-x Sn x layers with Sn content ranging from 6 at. % up to 15 at. % using isothermal processes in an industry-compatible reduced-pressure chemical vapor deposition reactor is presented. The epitaxy of Ge1-x Sn x layers has been optimized for a standard process offering a high Sn concentration at a large process window. By varying the N2 carrier gas flow, isothermal heterostructure designs suitable for quantum transport and spintronic devices are obtained.