SYSTEM AND METHOD FOR PROCESSING A TRANSPARENT MATERIAL

Disclosed is a system for processing a transparent material, comprising: a laser source configured to generate a laser beam comprising bursts of laser pulses, wherein the pulses are defined by a pulse energy and a pulse repetition rate; one or more focusing element(s) configured to receive the laser beam, and direct the laser beam towards the transparent material, said focusing element(s) comprise(s) a variable focal length configured for being changed from a first focal length to a second focal length along a focus direction, a first controller configured to change the variable focal length in an oscillating manner between the first focal length and the second focal length at a desired control-frequency.