STENCIL MASK AND USE THEREOF IN LITHOGRAPHY FABRICATION

The disclosure relates to a stencil mask, a method for manufacturing the stencil mask and use of the stencil mask in nanoscale device nanofabrication, including imprinting on substrates of deposition patterns for nanoscale devices. One embodiment relates to a stencil mask for manufacturing at least one nanoscale device on a substrate, the stencil mask comprising, a membrane having a top surface and bottom surface and a thickness therebetween of at least 500 nm, a predefined pattern of apertures extending through the membrane, each aperture having a width and a length in the top surface of the membrane, wherein at least the width and/or the length of one of said apertures is of less than 100 nm, each aperture defined by inner sidewalls extending between the top surface and the bottom surface of the membrane, and a set of separating nanostructures on the top surface of the membrane for separating the top surface of the membrane from a top surface of the substrate.